- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/033 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Patent holdings for IPC class G03F 7/033
Total number of patents in this class: 970
10-year publication summary
49
|
66
|
77
|
87
|
83
|
101
|
78
|
79
|
64
|
21
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
253 |
Samsung SDI Co., Ltd. | 6671 |
43 |
Hitachi Chemical Company, Ltd. | 2455 |
42 |
LG Chem, Ltd. | 17205 |
37 |
Asahi Kasei Kabushiki Kaisha | 2429 |
31 |
Eastman Kodak Company | 3444 |
27 |
Resonac Corporation | 2233 |
25 |
Toray Industries, Inc. | 6652 |
23 |
JSR Corporation | 2476 |
22 |
Samsung Electronics Co., Ltd. | 131630 |
18 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
16 |
Showa Denko Materials Co., Ltd. | 629 |
16 |
Boe Technology Group Co., Ltd. | 35384 |
15 |
Samsung Display Co., Ltd. | 30585 |
12 |
Merck Patent GmbH | 5909 |
12 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
12 |
Kolon Industries, Inc. | 1506 |
12 |
Sumitomo Chemical Company, Limited | 8808 |
10 |
Asahi Kasei E-materials Corporation | 222 |
10 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
10 |
Other owners | 324 |